erromagnetic Relaxation and Magnetic Properties of Co 40 Fe 40 B 20 Thin Films

Please use this identifier to cite or link to this item: http://digitalrepository.fccollege.edu.pk/handle/123456789/102

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DC Field	Value	Language
dc.contributor.author	Ahmad, Naveed	-
dc.contributor.author	Tian, Y. U.	-
dc.contributor.author	khan, Suleman	-
dc.contributor.author	Majid, Abdul	-
dc.contributor.author	Iqbal, Javed	-
dc.contributor.author	Shah, Saqlain Abbas	-
dc.contributor.author	Awan, S. U	-
dc.contributor.author	Han, X. F.	-
dc.date.accessioned	2018-06-29T07:28:16Z	-
dc.date.available	2018-06-29T07:28:16Z	-
dc.date.issued	2017-02-01	-
dc.identifier.uri	http://localhost:8080/xmlui/handle/123456789/102	-
dc.description	Abstract The Co 40 Fe 40 B 20 thin films with varying thickness using silicon dioxide (SiO 2) as substrate were fabricated by magnetron sputtering system (ULVAC, Japan) with a base pressure P= 10− 8 Torr to understand magnetodynamic interactions and structural properties. The samples were characterized using X-band ferromagnetic resonance experiments at room temperature. The XRD pattern shows that the thin film is amorphous and we got a strong peak (400) of substrate silicon dioxide (SiO 2). The SEM result of Co 40 Fe 40 B 20 thin film demonstrates that it has uniform and homogeneous morphology. It has been observed from ferromagnetic resonance (FMR) results that the thin film depicts anisotropic behavior and easy axis lies out of the plane.	en_US
dc.publisher	Springer US	en_US
dc.relation.ispartofseries	Vol 30: 2;469-473	-
dc.subject	Physics	en_US
dc.title	erromagnetic Relaxation and Magnetic Properties of Co 40 Fe 40 B 20 Thin Films	en_US
dc.type	Article	en_US
Appears in Collections:	Physics Department

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